Explanation/Annotation:Form-stable reactors to carry out of thermal processes of ïðîèçâîä
hyperfine interaction of semiconductor devices and integrated circuits within a range of ïîâû
øåííûõ temperatures
Detailed model description:Are being manufactured two types: ÐÔÊÀ (are being applied at temperatures of 1150-
1250 Celsius degrees) and ÐÔÊÀË (doped, apply to òåìïåðàòó
r 1200 - 1320 Celsius degrees)
the viscosity logarithm of glass at a temperature of 1250 Celsius degrees not
less 11
the content of main immixtures in glass not more 32, 7 ppm
the aluminum content in doped glass - to 0, 3% |
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