RMF-40GUZ
* RMF-40GUZ
| For measuring of volumetric discharge of gradually changing the uniform flows of pure and low-level contaminated gases. Fluoroplastic, with local indications. Base model - РМФ-VI.
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RMF-0,400GUZ
* RMF-0,400GUZ
| For measuring of volumetric discharge of gradually changing the uniform flows of pure and low-level contaminated gases. Fluoroplastic, with local indications. Base model - РМФ-II.
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RMF-0,4GUZ
* RMF-0,4GUZ
| For measuring of volumetric discharge of gradually changing the uniform flows of pure and low-level contaminated gases. Fluoroplastic, with local indications. Base model - РМФ-IV.
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RMF-0,630ZHUZ
* RMF-0,630ZHUZ
| For measuring of volumetric discharge of gradually changing the uniform flows of pure and low-level contaminated gases. Fluoroplastic, with local of оказани
Ями. Base model - РМФ-II.
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RMF-25GUZ
* RMF-25GUZ
| For measuring of volumetric discharge of gradually changing the uniform flows of pure and low-level contaminated gases. Fluoroplastic, with local indications. Base model - РМФ-VI.
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